The coating/developing cluster system is a versatile high-throughput wafer processing system, equipped with a coater, developer, vapor primer, HPO, cooling plate, etc. The coating/developing cluster system can handle a large amount of photoresists and photosensitive polymers. Its precise system software and reliable hardware configuration allow users to program hot plates at various baking temperatures and simultaneously perform priming, coating, and developing on wafers. The system has strong scalability to meet business expansion or process needs.
